C7460 데이터 시트보기 (PDF) - Hamamatsu Photonics
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C7460 Datasheet PDF : 8 Pages
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Multiband Plasma-Process Monitor
Model C7460
The Multiband Plasma-Process Monitor
(MPM) is a system specifically designed for
monitoring the optical plasma emissions that
are created during the various manufacturing
processes of semiconductors including
etching, sputtering, cleaning, and CVD.
The MPM can handle multi-channel recording
in real-time.
q Simultaneous measurement
from 200 to 950 nm
q Easy measurement using
optical fiber input
q High levels of accuracy and
reliability
q Software for measurement,
analysis and factory integration
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